- Title
- High-mass heterogeneous cluster formation by ion bombardment of the ternary alloy Au₇C₅Al₄
- Creator
- Zinovev, Alexander V.; King, Bruce V.; Veryovkin, Igor V.; Pellin, Michael J.
- Relation
- Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics Vol. 34, Issue 3, no. 03H108
- Publisher Link
- http://dx.doi.org/10.1116/1.4941140
- Publisher
- AIP Publishing
- Resource Type
- journal article
- Date
- 2016
- Description
- The ternary alloy Au₇C₅Al₄ was irradiated with 0.1-10 keV Ar⁺ and the surface composition analyzed using laser sputter neutral mass spectrometry. Ejected clusters containing up to seven atoms, with masses up to 2000 amu, were observed. By monitoring the signals from sputtered clusters, the surface composition of the alloy was seen to change with 100 eV Ar⁺ dose, reaching equilibrium after 10 nm of the surface was eroded, in agreement with TRIDYN simulation and indicating that the changes were due to preferential sputtering of Al and Cu. Ejected gold containing clusters were found to increase markedly in intensity while aluminum containing clusters decreased in intensity as a result of Ar sputtering. Such an effect was most pronounced for low energy (<1 keV) Ar⁺ sputtering and was consistent with TRIDYN simulations of the depth profiling. The component sputter yields from the ternary alloy were consistent with previous binary alloy measurements but showed greater Cu surface concentrations than expected from TRIDYN simulations.
- Subject
- gold; aluminium; sputtering; copper; surface composition
- Identifier
- http://hdl.handle.net/1959.13/1347753
- Identifier
- uon:30112
- Identifier
- ISSN:2166-2746
- Rights
- This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. The following article appeared in Zinovev AV, King BV, Veryovkin IV, Pellin MJ, 'High-mass heterogeneous cluster formation by ion bombardment of the ternary alloy Au7Cu5Al4', JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 34 (2016) and may be found at http://dx.doi.org/10.1116/1.4941140
- Language
- eng
- Full Text
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